Abstract
Columnar-structured rutile TiO2 film with a thickness of 1.4 μm is prepared using the radio-frequency (RF) magnetron sputtering technique, for application in dye-sensitized solar cells (DSSCs). Pure rutile TiO2 films are fabricated by controlling the substrate temperature during sputtering and using a substrate with a rough surface morphology. Successive substrate heating to 623 K induces the growth of a rutile TiO2 film that has a specific direction in the (1 1 0) plane, which results in a decrease in the average grain size. This causes in an increase of dye uptake and thereby contributes to enhancement of the photocurrent in the DSSC.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 331-335 |
| Number of pages | 5 |
| Journal | Journal of Power Sources |
| Volume | 184 |
| Issue number | 1 |
| DOIs | |
| State | Published - Sep 15 2008 |
Bibliographical note
Funding Information:This work was supported in part by KOSEF (Contract No. R01-2004-000-10143-0), and in part by the Research Center for Energy Conversion and Storage (Contract No. R11-2002-102-00000-0).
UN SDGs
This output contributes to the following UN Sustainable Development Goals (SDGs)
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SDG 7 Affordable and Clean Energy
Keywords
- Columnar structure
- Dye-sensitized solar cell
- Photocurrent
- Radio-frequency magnetron sputtering
- Rutile TiO
- Substrate heating
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