Columnar rutile TiO2 based dye-sensitized solar cells by radio-frequency magnetron sputtering

Soon Hyung Kang; Moon Sung Kang; Hyun Sik Kim; Jae Yup Kim; Young Hoon Chung; William H. Smyrl; Yung Eun Sung

doi:10.1016/j.jpowsour.2008.05.089

Columnar rutile TiO₂ based dye-sensitized solar cells by radio-frequency magnetron sputtering

Soon Hyung Kang, Moon Sung Kang, Hyun Sik Kim, Jae Yup Kim, Young Hoon Chung, William H. Smyrl, Yung Eun Sung

Chemical Engineering and Materials Science

Research output: Contribution to journal › Article › peer-review

59 Scopus citations

Abstract

Columnar-structured rutile TiO₂ film with a thickness of 1.4 μm is prepared using the radio-frequency (RF) magnetron sputtering technique, for application in dye-sensitized solar cells (DSSCs). Pure rutile TiO₂ films are fabricated by controlling the substrate temperature during sputtering and using a substrate with a rough surface morphology. Successive substrate heating to 623 K induces the growth of a rutile TiO₂ film that has a specific direction in the (1 1 0) plane, which results in a decrease in the average grain size. This causes in an increase of dye uptake and thereby contributes to enhancement of the photocurrent in the DSSC.

Original language	English (US)
Pages (from-to)	331-335
Number of pages	5
Journal	Journal of Power Sources
Volume	184
Issue number	1
DOIs	https://doi.org/10.1016/j.jpowsour.2008.05.089
State	Published - Sep 15 2008

Bibliographical note

Funding Information:
This work was supported in part by KOSEF (Contract No. R01-2004-000-10143-0), and in part by the Research Center for Energy Conversion and Storage (Contract No. R11-2002-102-00000-0).

Keywords

Columnar structure
Dye-sensitized solar cell
Photocurrent
Radio-frequency magnetron sputtering
Rutile TiO
Substrate heating

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

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10.1016/j.jpowsour.2008.05.089

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title = "Columnar rutile TiO2 based dye-sensitized solar cells by radio-frequency magnetron sputtering",

abstract = "Columnar-structured rutile TiO2 film with a thickness of 1.4 μm is prepared using the radio-frequency (RF) magnetron sputtering technique, for application in dye-sensitized solar cells (DSSCs). Pure rutile TiO2 films are fabricated by controlling the substrate temperature during sputtering and using a substrate with a rough surface morphology. Successive substrate heating to 623 K induces the growth of a rutile TiO2 film that has a specific direction in the (1 1 0) plane, which results in a decrease in the average grain size. This causes in an increase of dye uptake and thereby contributes to enhancement of the photocurrent in the DSSC.",

keywords = "Columnar structure, Dye-sensitized solar cell, Photocurrent, Radio-frequency magnetron sputtering, Rutile TiO, Substrate heating",

author = "Kang, {Soon Hyung} and Kang, {Moon Sung} and Kim, {Hyun Sik} and Kim, {Jae Yup} and Chung, {Young Hoon} and Smyrl, {William H.} and Sung, {Yung Eun}",

note = "Funding Information: This work was supported in part by KOSEF (Contract No. R01-2004-000-10143-0), and in part by the Research Center for Energy Conversion and Storage (Contract No. R11-2002-102-00000-0).",

year = "2008",

month = sep,

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language = "English (US)",

volume = "184",

pages = "331--335",

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T1 - Columnar rutile TiO2 based dye-sensitized solar cells by radio-frequency magnetron sputtering

AU - Kang, Soon Hyung

AU - Kang, Moon Sung

AU - Kim, Hyun Sik

AU - Kim, Jae Yup

AU - Chung, Young Hoon

AU - Smyrl, William H.

AU - Sung, Yung Eun

N1 - Funding Information: This work was supported in part by KOSEF (Contract No. R01-2004-000-10143-0), and in part by the Research Center for Energy Conversion and Storage (Contract No. R11-2002-102-00000-0).

PY - 2008/9/15

Y1 - 2008/9/15

N2 - Columnar-structured rutile TiO2 film with a thickness of 1.4 μm is prepared using the radio-frequency (RF) magnetron sputtering technique, for application in dye-sensitized solar cells (DSSCs). Pure rutile TiO2 films are fabricated by controlling the substrate temperature during sputtering and using a substrate with a rough surface morphology. Successive substrate heating to 623 K induces the growth of a rutile TiO2 film that has a specific direction in the (1 1 0) plane, which results in a decrease in the average grain size. This causes in an increase of dye uptake and thereby contributes to enhancement of the photocurrent in the DSSC.

AB - Columnar-structured rutile TiO2 film with a thickness of 1.4 μm is prepared using the radio-frequency (RF) magnetron sputtering technique, for application in dye-sensitized solar cells (DSSCs). Pure rutile TiO2 films are fabricated by controlling the substrate temperature during sputtering and using a substrate with a rough surface morphology. Successive substrate heating to 623 K induces the growth of a rutile TiO2 film that has a specific direction in the (1 1 0) plane, which results in a decrease in the average grain size. This causes in an increase of dye uptake and thereby contributes to enhancement of the photocurrent in the DSSC.

KW - Columnar structure

KW - Dye-sensitized solar cell

KW - Photocurrent

KW - Radio-frequency magnetron sputtering

KW - Rutile TiO

KW - Substrate heating

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