Coarse-grained molecular dynamics modeling of the kinetics of lamellar BCP defect annealing

Andrew J Peters, Richard A. Lawson, Benjamin D. Nation, Peter J. Ludovice, Clifford L. Henderson

Research output: Chapter in Book/Report/Conference proceedingConference contribution

7 Scopus citations


Directed self-assembly of block copolymers (BCPs) is a process that has received great interest in the field of nanomanufacturing in the past decade, and great strides towards forming high quality aligned patterns have been made. But state of the art methods still yield defectivities orders of magnitude higher than is necessary in semi-conductor fabrication even though free energy calculations suggest that equilibrium defectivities are much lower than is necessary for economic semi-conductor fabrication. This disparity suggests that the main problem may lie in the kinetics of defect removal. This work uses a coarse-grained model to study the rates, pathways, and dependencies of healing a common defect to give insight into the fundamental processes that control defect healing and give guidance on optimal process conditions for BCP-DSA. It is found that infinitely thick films yield an exponential drop in defect heal rate above ΧN ∼ 30. Below ΧN ∼ 30, the rate of transport was similar to the rate at which the transition state was reached so that the overall rate changed only slightly. The energy barrier in periodic simulations increased with 0.31 ΧN on average. Thin film simulations show no change in rate associated with the energy barrier below ΧN ∼ 50, and then show an increase in energy barrier scaling with 0.16ΧN. Thin film simulations always begin to heal at either the free interface or the BCP-underlayer interface where the increased A-B contact area associated with the transition state will be minimized, while the infinitely thick films must start healing in the bulk where the A-B contact area is increased. It is also found that cooperative chain movement is required for the defect to start healing.

Original languageEnglish (US)
Title of host publicationAlternative Lithographic Technologies VII
EditorsChristopher Bencher, Douglas J. Resnick
ISBN (Electronic)9781628415254
StatePublished - Jan 1 2015
EventAlternative Lithographic Technologies VII - San Jose, United States
Duration: Feb 23 2015Feb 26 2015

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X


OtherAlternative Lithographic Technologies VII
Country/TerritoryUnited States
CitySan Jose


  • Block co-polymer
  • DSA
  • Directed self-assembly
  • Dissipative particle dynamics simulation
  • Hole multiplication
  • Hole shrink
  • Placement error


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