Chemical vapor deposition membranes

M. Tsapatsis; G. R. Gavalas; G. Xomeritakis

doi:10.1016/S0927-5193(00)80017-0

Chemical vapor deposition membranes

M. Tsapatsis, G. R. Gavalas, G. Xomeritakis

Chemical Engineering and Materials Science

Research output: Contribution to journal › Article › peer-review

12 Scopus citations

Abstract

This chapter is divided into four sections the first of which treats issues of general relevance to Chemical Vapor Deposition (CVD) of membranes, the second reviews work on dense silica membranes, the third is devoted to Y₂O₃-stabilized ZrO₂ (YSZ) membranes, and the fourth treats CVD of Pd membranes.

Original language	English (US)
Pages (from-to)	397-416
Number of pages	20
Journal	Membrane Science and Technology
Volume	6
Issue number	C
DOIs	https://doi.org/10.1016/S0927-5193(00)80017-0
State	Published - Dec 1 2000

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abstract = "This chapter is divided into four sections the first of which treats issues of general relevance to Chemical Vapor Deposition (CVD) of membranes, the second reviews work on dense silica membranes, the third is devoted to Y2O3-stabilized ZrO2 (YSZ) membranes, and the fourth treats CVD of Pd membranes.",

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