Chemical solution deposition of epitaxial carbide films

Guifu Zou, Haiyan Wang, Nathan Mara, Hongmei Luo, Nan Li, Zengfeng Di, Eve Bauer, Yongqiang Wang, Thomas McCleskey, Anthony Burrell, Xinghang Zhang, Michael Nastasi, Quanxi Jia

Research output: Contribution to journalArticlepeer-review

42 Scopus citations


(Figure Presented) Carbide films exhibit many unique properties. The development of a versatile and simple technique for the deposition of carbide films will enable a wide range of technological applications. Here we report a cost-effective chemical solution deposition or polymer-assisted deposition method for growing epitaxial carbide (including TiC, VC, and TaC) films. These epitaxial carbide films exhibit structural and physical properties similar to the films grown by vapor deposition methods.

Original languageEnglish (US)
Pages (from-to)2516-2517
Number of pages2
JournalJournal of the American Chemical Society
Issue number8
StatePublished - Feb 24 2010


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