Characterization of pattern transfer in the fabrication of magnetic nanostructure arrays by block copolymer lithography

T. Kubo, J. S. Parker, M. A. Hillmyer, C. Leighton

Research output: Contribution to journalArticle

22 Citations (Scopus)

Abstract

The authors report the fabrication of large-area antidot arrays using cylinder-forming polystyrene-polyisoprene-polylactide triblock terpolymer templates. 30 nm antidots were generated after removal of the minority polymer component by aqueous degradation, oxygen reactive ion etching, and subsequent Ar ion beam milling to transfer the pattern to an underlying Ni80 Fe20 film. Emphasis was placed on characterization of the pattern transfer, which was tracked using a combination of atomic force microscopy, magnetometry, and magnetotransport. It is demonstrated that variable temperature magnetometry and transport measurements are excellent probes of the progress of the ion milling into underlying magnetic layers.

Original languageEnglish (US)
Article number233113
JournalApplied Physics Letters
Volume90
Issue number23
DOIs
StatePublished - Jun 27 2007

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block copolymers
magnetic measurement
lithography
polyisoprenes
fabrication
minorities
polystyrene
ions
templates
ion beams
etching
atomic force microscopy
degradation
probes
polymers
oxygen
temperature

Cite this

Characterization of pattern transfer in the fabrication of magnetic nanostructure arrays by block copolymer lithography. / Kubo, T.; Parker, J. S.; Hillmyer, M. A.; Leighton, C.

In: Applied Physics Letters, Vol. 90, No. 23, 233113, 27.06.2007.

Research output: Contribution to journalArticle

@article{69d3410ddda04403a80b43df0c81d336,
title = "Characterization of pattern transfer in the fabrication of magnetic nanostructure arrays by block copolymer lithography",
abstract = "The authors report the fabrication of large-area antidot arrays using cylinder-forming polystyrene-polyisoprene-polylactide triblock terpolymer templates. 30 nm antidots were generated after removal of the minority polymer component by aqueous degradation, oxygen reactive ion etching, and subsequent Ar ion beam milling to transfer the pattern to an underlying Ni80 Fe20 film. Emphasis was placed on characterization of the pattern transfer, which was tracked using a combination of atomic force microscopy, magnetometry, and magnetotransport. It is demonstrated that variable temperature magnetometry and transport measurements are excellent probes of the progress of the ion milling into underlying magnetic layers.",
author = "T. Kubo and Parker, {J. S.} and Hillmyer, {M. A.} and C. Leighton",
year = "2007",
month = "6",
day = "27",
doi = "10.1063/1.2743900",
language = "English (US)",
volume = "90",
journal = "Applied Physics Letters",
issn = "0003-6951",
publisher = "American Institute of Physics Publising LLC",
number = "23",

}

TY - JOUR

T1 - Characterization of pattern transfer in the fabrication of magnetic nanostructure arrays by block copolymer lithography

AU - Kubo, T.

AU - Parker, J. S.

AU - Hillmyer, M. A.

AU - Leighton, C.

PY - 2007/6/27

Y1 - 2007/6/27

N2 - The authors report the fabrication of large-area antidot arrays using cylinder-forming polystyrene-polyisoprene-polylactide triblock terpolymer templates. 30 nm antidots were generated after removal of the minority polymer component by aqueous degradation, oxygen reactive ion etching, and subsequent Ar ion beam milling to transfer the pattern to an underlying Ni80 Fe20 film. Emphasis was placed on characterization of the pattern transfer, which was tracked using a combination of atomic force microscopy, magnetometry, and magnetotransport. It is demonstrated that variable temperature magnetometry and transport measurements are excellent probes of the progress of the ion milling into underlying magnetic layers.

AB - The authors report the fabrication of large-area antidot arrays using cylinder-forming polystyrene-polyisoprene-polylactide triblock terpolymer templates. 30 nm antidots were generated after removal of the minority polymer component by aqueous degradation, oxygen reactive ion etching, and subsequent Ar ion beam milling to transfer the pattern to an underlying Ni80 Fe20 film. Emphasis was placed on characterization of the pattern transfer, which was tracked using a combination of atomic force microscopy, magnetometry, and magnetotransport. It is demonstrated that variable temperature magnetometry and transport measurements are excellent probes of the progress of the ion milling into underlying magnetic layers.

UR - http://www.scopus.com/inward/record.url?scp=34250742468&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=34250742468&partnerID=8YFLogxK

U2 - 10.1063/1.2743900

DO - 10.1063/1.2743900

M3 - Article

AN - SCOPUS:34250742468

VL - 90

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

IS - 23

M1 - 233113

ER -