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Characteristics sensitivity of FinFET to fin vertical nonuniformity
Jiaojiao Xu
, Chenyue Ma
, Chenfei Zhang
, Xiufang Zhang
, Wen Wu
,
Yu Cao
, Wenping Wang
, Yun Ye
, Shengqi Yang
, Xinnan Lin
, Jin He
Research output
:
Chapter in Book/Report/Conference proceeding
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Keyphrases
Non-uniformity
100%
Fin Field-effect Transistor (FinFET)
100%
Deviation Angle
66%
Digital Circuits
33%
Thickness Variation
33%
Analog Circuits
33%
Etching Process
33%
Resistors
33%
Threshold Voltage
33%
Circuit Performance
33%
Compact Device
33%
Paper-based
33%
Fin Width
33%
Fin Height
33%
Characteristic Variation
33%
Subthreshold Slope
33%
Device Model
33%
Engineering
Analog Circuit
100%
Circuit Performance
100%
Subthreshold Slope
100%
Etching Process
100%
Compact Device
100%
Fin Thickness
100%
Fin Height
100%