Calibration technique for MEMS membrane type strain sensors

Li Cao, Tae Song Kim, Jia Zhou, Susan C. Mantell, Dennis L. Polla

Research output: Contribution to journalConference articlepeer-review

11 Scopus citations


A MEMS based piezoresistive strain sensor was designed, fabricated and calibrated. A single strip of doped n-polysilicon sensing material was patterned over a thin Si3N4/SiO2 membrane. The silicon wafer was etched beneath this thin membrane. The intent of this design was to fabricate a flexible MEMS strain sensor. A calibration technique for measuring the strain sensor performance is described. The sensor calibration technique (to find the relationship between change in resistance and strain) entails developing a repeatable relationship between the change in sensor resistance and the strain measured at the sensor. The sensor sensitivity is evaluated by embedding the sensor in a vinyl ester epoxy plate and loading the plate. This calibration technique captures the effects of strain transfer to the stiff silicon wafer.

Original languageEnglish (US)
Pages (from-to)204-210
Number of pages7
JournalBiennial University/Government/Industry Microelectronics Symposium - Proceedings
StatePublished - 1999
EventProceedings of the 1999 13th Biennial University / Goverment / Industry Microelectronics Symposium (UGIM) - Minneapolis, MN, USA
Duration: Jun 20 1999Jun 23 1999


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