Bond strength and nanoroughness assessment on human pretreated cementum surfaces

M. Toledano, E. Osorio, F. S. Aguilera, G. Gomes, J. Perdigão, R. Osorio

Research output: Contribution to journalArticlepeer-review

2 Scopus citations


Objectives: To determine the bond strength of seven adhesive systems to human cementum, and to assess the promoted surface roughness. Methods: Extracted human canines were used for the present study. The mesial surface from the cervical third of the roots were ground flat with wet 600-grit silicon carbide paper and bonded. Seven adhesive systems were employed: an etch-and-rinse adhesive (Single Bond), two two-step self-etching (Clearfil SE Bond and Resulcin Aquaprime) and four one-step self-etching (One-up Bond F, Prompt-L-Pop, Etch and Prime 3.0 and NRC+Prime&Bond NT). Composite build-ups were constructed and stored in a humid environment for 24 h at 37 °C. Specimens were sectioned into 1 mm2 beams and tested for microtensile bond strength (MTBS). Additional surfaces were conditioned for atomic force microscopy (AFM) analysis. Results were analyzed with ANOVA and Student-Newman-Keuls tests (P < 0.05). Results: Single Bond showed the highest MTBS values. No differences were found between Resulcin Aquaprime, One-up Bond and Prompt-L-Pop. Clearfil SE Bond, Etch and Prime and NRC+Prime&Bond NT obtained the lowest bond strength values. H3PO4 acid treatment of cementum and Resulcin Aquaprime showed the highest nanoroughness parameters and One-up Bond the lowest. Conclusion: The etch-and-rinse adhesive and the two-step self-etching adhesive with the lowest pH value promoted the highest bond strength to human cementum surfaces.

Original languageEnglish (US)
Pages (from-to)678-685
Number of pages8
JournalJournal of Dentistry
Issue number8
StatePublished - Aug 2010

Bibliographical note

Funding Information:
This work was supported by grants CICYT/FEDER MAT2008-02347, JA-P07-CTS2568 and JA-P08-CTS-3944.


  • AFM
  • Adhesion
  • Adhesives
  • Cementum
  • Dental
  • Etching
  • Nanoroughness
  • Phosphoric acid
  • Self-etching
  • Surface


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