Block copolymers for DSA in the 100 Å regime

C. Grant Willson, Gregory Blachut, Michael J. Maher, William J. Durand, Christopher M. Bates, Matthew C. Carlson, Jeffrey L. Self, Austin P. Lane, Yusuke Asano, Stephen Sirard, Colin O. Hayes, Christopher J. Ellison

Research output: Contribution to journalArticlepeer-review


Block copolymers with lines and spaces in the 100 Å regime have been oriented using a perfectly neutral top coat and bottom coat and these structures have been successfully developed with RIE to provide high aspect ratio topographic features. Under these conditions, the materials can be annealed in less than 60 seconds. Future work will be directed toward continued increases in χ and development of simple and efficient processes for orienting these structures.

Original languageEnglish (US)
Pages (from-to)415-418
Number of pages4
JournalJournal of Photopolymer Science and Technology
Issue number4
StatePublished - Sep 13 2014

Bibliographical note

Publisher Copyright:
© 2014SPST.


  • Block copolymers
  • DSA
  • Etching
  • Lithography


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