A bilayer resist system is demonstrated using chlorinated polymethylstyrene-polydimethylsiloxane (CPMS/DMS) block copolymers. The copolymers are prepared using anionic polymerization techniques and are subsequently sensitized to electron beam, and 250-300 nm radiation by preferential chlorination of the polymethylstyrene block. The electron lithographic performance of a block copolymer containing 15. 5 wt% silicon and 0. 58 chlorines per methylstyrene unit is described. These results derive from the intrinsic behavior of block copolymers, which provides for the synergistic combination of inherently distinct polymer species while avoiding macroscopic phase separation prevalent in homopolymer blends. The concept of utilizing block copolymers as resists is general and may be extended to positive tone resists as well.
|Original language||English (US)|
|Title of host publication||Technical Papers, Regional Technical Conference - Society of Plastics Engineers|
|Publisher||Soc of Plastics Engineers Inc|
|Number of pages||11|
|State||Published - Dec 1 1985|