BLOCK COPOLYMERS AS BILEVEL RESISTS.

M. A. Hartney, A. E. Novembre, F. S. Bates

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Scopus citations

Abstract

A bilayer resist system is demonstrated using chlorinated polymethylstyrene-polydimethylsiloxane (CPMS/DMS) block copolymers. The copolymers are prepared using anionic polymerization techniques and are subsequently sensitized to electron beam, and 250-300 nm radiation by preferential chlorination of the polymethylstyrene block. The electron lithographic performance of a block copolymer containing 15. 5 wt% silicon and 0. 58 chlorines per methylstyrene unit is described. These results derive from the intrinsic behavior of block copolymers, which provides for the synergistic combination of inherently distinct polymer species while avoiding macroscopic phase separation prevalent in homopolymer blends. The concept of utilizing block copolymers as resists is general and may be extended to positive tone resists as well.

Original languageEnglish (US)
Title of host publicationTechnical Papers, Regional Technical Conference - Society of Plastics Engineers
PublisherSoc of Plastics Engineers Inc
Pages211-221
Number of pages11
StatePublished - Dec 1 1985

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