Block copolymer orientation control using a top-coat surface treatment

Takehiro Seshimo, Christopher M. Bates, Leon M. Dean, Julia D. Cushen, William J. Durand, Michael J. Maher, Christopher J. Ellison, C. Grant Willson

Research output: Contribution to journalArticlepeer-review

13 Scopus citations


Directed self-assembly of Si containing block copolymers (BCP) is a candidate for next generation patterning technology because it enables both high resolution and high etch contrast. Achieving high resolution requires a high χ parameter. However, it is often difficult to achieve perpendicular patterns by thermal annealing of BCPs with a lower surface energy block, which tends to align with the air interface. New top surface treatment materials that provide a surface energy between those of the blocks have been developed that enable perpendicular pattern alignment with block copolymers that have a low surface energy block.

Original languageEnglish (US)
Pages (from-to)125-130
Number of pages6
JournalJournal of Photopolymer Science and Technology
Issue number1
StatePublished - 2012


  • Directed self assembly
  • Si-containing block copolymer
  • Top-coat


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