Block copolymer lithography

Christopher M. Bates, Michael J. Maher, Dustin W. Janes, Christopher J. Ellison, C. Grant Willson

Research output: Contribution to journalReview articlepeer-review

551 Scopus citations


This Perspective addresses the current state of block copolymer lithography and identifies key challenges and opportunities within the field. Significant strides in experimental and theoretical thin film research have nucleated the transition of block copolymers "from lab to fab", but outstanding questions remain about the optimal materials, processes, and analytical techniques for first-generation devices and beyond. Particular attention herein is focused on advances and issues related to thermal annealing. Block copolymers are poised to change the traditional lithographic resolution enhancement paradigm from "top-down" to "bottom-up".

Original languageEnglish (US)
Pages (from-to)2-12
Number of pages11
Issue number1
StatePublished - Jan 14 2014
Externally publishedYes


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