Keyphrases
Plasma Deposition
100%
Atomistic Calculations
100%
Surface Reactivity
100%
Amorphous Silicon Thin Film
100%
SiH3
100%
A-Si
80%
Recombination
60%
Sticking
60%
Langmuir-Hinshelwood
60%
Surface Reaction
40%
Temperature Range
40%
Eley-Rideal
40%
Molecular Dynamics Simulation
20%
Temperature Effect
20%
Impingement
20%
Silane
20%
Hydrogenated Amorphous Silicon
20%
Reaction Probability
20%
Desorption
20%
Temperature-independent
20%
Exergetic Analysis
20%
Barrier-free
20%
H Content
20%
Si Dangling Bonds
20%
Growth Areas
20%
Disilane
20%
Abstract Surface
20%
Si2H6
20%
Radical Adsorption
20%
Temperature Independence
20%
Material Science
Amorphous Silicon
100%
Plasma Deposition
100%
Surface (Surface Science)
100%
Thin Films
100%
Film
80%
Surface Reaction
40%
Desorption
20%
Silane
20%