Atomic-scale analysis of radical precursor and hydrogen surface diffusion on plasma-deposited amorphous silicon thin films

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Original language	English (US)
Title of host publication	05AIChE
Subtitle of host publication	2005 AIChE Annual Meeting and Fall Showcase, Conference Proceedings
Number of pages	1
State	Published - Dec 1 2005
Event	05AIChE: 2005 AIChE Annual Meeting and Fall Showcase - Cincinnati, OH, United States Duration: Oct 30 2005 → Nov 4 2005

Other	05AIChE: 2005 AIChE Annual Meeting and Fall Showcase
Country/Territory	United States
City	Cincinnati, OH
Period	10/30/05 → 11/4/05

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@inproceedings{29b57fe261524901b58385cb7af0f492,

title = "Atomic-scale analysis of radical precursor and hydrogen surface diffusion on plasma-deposited amorphous silicon thin films",

author = "Valipa, \{Mayur S.\} and Tamas Bakos and Aydil, \{Eray S.\} and Dimitrios Maroudas",

year = "2005",

month = dec,

day = "1",

language = "English (US)",

booktitle = "05AIChE",

note = "05AIChE: 2005 AIChE Annual Meeting and Fall Showcase ; Conference date: 30-10-2005 Through 04-11-2005",

}

TY - GEN

T1 - Atomic-scale analysis of radical precursor and hydrogen surface diffusion on plasma-deposited amorphous silicon thin films

AU - Valipa, Mayur S.

AU - Bakos, Tamas

AU - Aydil, Eray S.

AU - Maroudas, Dimitrios

PY - 2005/12/1

Y1 - 2005/12/1

UR - https://www.scopus.com/pages/publications/33645634666

UR - https://www.scopus.com/pages/publications/33645634666#tab=citedBy

M3 - Conference contribution

AN - SCOPUS:33645634666

BT - 05AIChE

T2 - 05AIChE: 2005 AIChE Annual Meeting and Fall Showcase

Y2 - 30 October 2005 through 4 November 2005

ER -