Atomic layer deposition of p-type phosphorus-doped zinc oxide films using diethylzinc, ozone and trimethylphosphite

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Abstract

A method was developed to deposit phosphorus-doped ZnO films using atomic layer deposition where the oxygen, zinc and phosphorus atoms were supplied by ozone, diethylzinc and trimethylphosphite, respectively. X-ray photoelectron spectroscopy established that the phosphorus was present in the 5 oxidation state, where it substituted for larger zinc ions to cause a measurable decrease in the c lattice constant of the textured polycrystalline films. The electrical behavior of the as-deposited film was n-type, but this changed to p-type following rapid thermal annealing in oxygen. The temperature of the n- to p-type transition decreased as the phosphorus concentration increased.

Original languageEnglish (US)
Pages (from-to)H181-H183
JournalElectrochemical and Solid-State Letters
Volume14
Issue number5
DOIs
StatePublished - 2011

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