Atomic layer deposition of Cu(i) oxide films using Cu(II) bis(dimethylamino-2-propoxide) and water

Keyphrases

• Oxide Film 100%
• Atomic Layer Deposition 100%
• Dimethylamino 100%
• Cu(II) 100%
• Growth Rate 50%
• In Situ 50%
• Copper(II) Oxide 50%
• Water Vapor 50%
• X-ray Photoelectron Spectroscopy 50%
• Quartz Crystal Microbalance with Dissipation (QCM-D) 50%
• Cu-Cu 50%
• Coreactant 50%
• Metal Oxide Films 50%
• Discrete-time Markovian Arrival Process (D-MAP) 50%

Engineering

• Atomic Layer Deposition 100%
• Oxide Film 100%
• Reactant 50%
• Ray Photoelectron Spectroscopy 50%
• Quartz Crystal Microbalance 50%

Material Science

• Oxide Film 100%
• Metal Oxide 50%
• Film 50%
• X-Ray Photoelectron Spectroscopy 50%
• Water Vapor 50%