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Application of particle beam mass spectrometry to aerosol formation and transport in silane LPCVD

  • S. Nijhawan
  • , N. P. Rao
  • , P. H. Mcmurry
  • , S. A. Campbell
  • , J. E. Brockmann

Research output: Contribution to journalArticlepeer-review

Original languageEnglish (US)
Pages (from-to)S81-S82
JournalJournal of Aerosol Science
Volume29
Issue numberSUPPL 1
DOIs
StatePublished - Sep 1998

Keywords

  • Chemical Vapor Deposition
  • Contamination Control
  • Semiconductor Processing
  • Silicon
  • Thermophoresis

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