Anhydrous Metal Nitrates as Volatile Single Source Precursors for the CVD of Metal Oxide Films

Daniel G. Colombo; David C. Gilmer; Victor G. Young; Stephen A. Campbell; Wayne L. Gladfelter

doi:10.1002/(SICI)1521-3862(199812)04:06<220::AID-CVDE220>3.0.CO;2-E

Anhydrous Metal Nitrates as Volatile Single Source Precursors for the CVD of Metal Oxide Films

Daniel G. Colombo, David C. Gilmer, Victor G. Young, Stephen A. Campbell, Wayne L. Gladfelter

Research output: Contribution to journal › Article › peer-review

Original language	English (US)
Pages (from-to)	220-222
Number of pages	3
Journal	Chemical Vapor Deposition
Volume	4
Issue number	6
DOIs	https://doi.org/10.1002/(SICI)1521-3862(199812)04:06<220::AID-CVDE220>3.0.CO;2-E
State	Published - 1998

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10.1002/(SICI)1521-3862(199812)04:06<220::AID-CVDE220>3.0.CO;2-E

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@article{52d4d28ccd644e08b31e557a08cccbd8,

title = "Anhydrous Metal Nitrates as Volatile Single Source Precursors for the CVD of Metal Oxide Films",

author = "Colombo, {Daniel G.} and Gilmer, {David C.} and Young, {Victor G.} and Campbell, {Stephen A.} and Gladfelter, {Wayne L.}",

year = "1998",

doi = "10.1002/(SICI)1521-3862(199812)04:06<220::AID-CVDE220>3.0.CO;2-E",

language = "English (US)",

volume = "4",

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journal = "Chemical Vapor Deposition",

issn = "0948-1907",

publisher = "Wiley-VCH Verlag",

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T1 - Anhydrous Metal Nitrates as Volatile Single Source Precursors for the CVD of Metal Oxide Films

AU - Colombo, Daniel G.

AU - Gilmer, David C.

AU - Young, Victor G.

AU - Campbell, Stephen A.

AU - Gladfelter, Wayne L.

PY - 1998

Y1 - 1998

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U2 - 10.1002/(SICI)1521-3862(199812)04:06<220::AID-CVDE220>3.0.CO;2-E

DO - 10.1002/(SICI)1521-3862(199812)04:06<220::AID-CVDE220>3.0.CO;2-E

M3 - Article

AN - SCOPUS:0001076153

SN - 0948-1907

VL - 4

SP - 220

EP - 222

JO - Chemical Vapor Deposition

JF - Chemical Vapor Deposition

IS - 6

ER -

Anhydrous Metal Nitrates as Volatile Single Source Precursors for the CVD of Metal Oxide Films

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