Analytical-statistical model to accurately estimate diffusional nanoparticle deposition on inverted surfaces at low pressure

Christof Asbach, Burkhard Stahlmecke, Heinz Fissan, Thomas A.J. Kuhlbusch, Jing Wang, David Y.H. Pui

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

Particle contamination is a major concern in clean manufacturing. We present a model that predicts the diffusional particle contamination probability on inverted surfaces under the influence of gravity and thermophoresis at low pressure level. The model follows an analytical-statistical approach that can be solved using common spreadsheet software; therefore, not requiring major computational resources. The model revealed that thermophoresis can effectively eliminate diffusional deposition. Assuming that a contamination probability of 0.1% is acceptable, a thermal gradient of 10 Kcm protects against the deposition of all particles 30 nm with an initial distance of 1 mm or more.

Original languageEnglish (US)
Article number064107
JournalApplied Physics Letters
Volume92
Issue number6
DOIs
StatePublished - Feb 22 2008

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thermophoresis
contamination
low pressure
nanoparticles
estimates
spreadsheets
resources
manufacturing
gravitation
computer programs
gradients

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Analytical-statistical model to accurately estimate diffusional nanoparticle deposition on inverted surfaces at low pressure. / Asbach, Christof; Stahlmecke, Burkhard; Fissan, Heinz; Kuhlbusch, Thomas A.J.; Wang, Jing; Pui, David Y.H.

In: Applied Physics Letters, Vol. 92, No. 6, 064107, 22.02.2008.

Research output: Contribution to journalArticle

Asbach, Christof ; Stahlmecke, Burkhard ; Fissan, Heinz ; Kuhlbusch, Thomas A.J. ; Wang, Jing ; Pui, David Y.H. / Analytical-statistical model to accurately estimate diffusional nanoparticle deposition on inverted surfaces at low pressure. In: Applied Physics Letters. 2008 ; Vol. 92, No. 6.
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