Analytical modeling of particle stopping distance at low pressure to evaluate protection schemes for extreme ultraviolet lithography masks

Christof Asbach, Jung Hyeun Kim, Se Jin Yook, David Y.H. Pui, Heinz Fissan

Research output: Contribution to journalArticle

14 Citations (Scopus)

Abstract

We developed an analytical model that predicts the distance, particles can travel towards the critical surface of an extreme ultraviolet lithography mask as a function of their initial velocity and all forces (gravity, drag, thermophoresis, and electrophoresis) acting on the particles. To avoid gravitational settling of particles onto the mask, its critical surface is facing down. The model shows that at the low pressure level (50 mTorr), drag force is the dominating force to decelerate particles. Thermophoresis can add additional protection. Electrophoresis can be very effective, however, all particles must be unipolarly charged to make use of the Coulomb force.

Original languageEnglish (US)
Article number234111
Pages (from-to)1-3
Number of pages3
JournalApplied Physics Letters
Volume87
Issue number23
DOIs
StatePublished - Dec 12 2005

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stopping
masks
lithography
low pressure
thermophoresis
electrophoresis
drag
settling
travel
gravitation

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Analytical modeling of particle stopping distance at low pressure to evaluate protection schemes for extreme ultraviolet lithography masks. / Asbach, Christof; Kim, Jung Hyeun; Yook, Se Jin; Pui, David Y.H.; Fissan, Heinz.

In: Applied Physics Letters, Vol. 87, No. 23, 234111, 12.12.2005, p. 1-3.

Research output: Contribution to journalArticle

@article{71d4a6d8352d42c7a4d219cf96515030,
title = "Analytical modeling of particle stopping distance at low pressure to evaluate protection schemes for extreme ultraviolet lithography masks",
abstract = "We developed an analytical model that predicts the distance, particles can travel towards the critical surface of an extreme ultraviolet lithography mask as a function of their initial velocity and all forces (gravity, drag, thermophoresis, and electrophoresis) acting on the particles. To avoid gravitational settling of particles onto the mask, its critical surface is facing down. The model shows that at the low pressure level (50 mTorr), drag force is the dominating force to decelerate particles. Thermophoresis can add additional protection. Electrophoresis can be very effective, however, all particles must be unipolarly charged to make use of the Coulomb force.",
author = "Christof Asbach and Kim, {Jung Hyeun} and Yook, {Se Jin} and Pui, {David Y.H.} and Heinz Fissan",
year = "2005",
month = "12",
day = "12",
doi = "10.1063/1.2140475",
language = "English (US)",
volume = "87",
pages = "1--3",
journal = "Applied Physics Letters",
issn = "0003-6951",
publisher = "American Institute of Physics Publising LLC",
number = "23",

}

TY - JOUR

T1 - Analytical modeling of particle stopping distance at low pressure to evaluate protection schemes for extreme ultraviolet lithography masks

AU - Asbach, Christof

AU - Kim, Jung Hyeun

AU - Yook, Se Jin

AU - Pui, David Y.H.

AU - Fissan, Heinz

PY - 2005/12/12

Y1 - 2005/12/12

N2 - We developed an analytical model that predicts the distance, particles can travel towards the critical surface of an extreme ultraviolet lithography mask as a function of their initial velocity and all forces (gravity, drag, thermophoresis, and electrophoresis) acting on the particles. To avoid gravitational settling of particles onto the mask, its critical surface is facing down. The model shows that at the low pressure level (50 mTorr), drag force is the dominating force to decelerate particles. Thermophoresis can add additional protection. Electrophoresis can be very effective, however, all particles must be unipolarly charged to make use of the Coulomb force.

AB - We developed an analytical model that predicts the distance, particles can travel towards the critical surface of an extreme ultraviolet lithography mask as a function of their initial velocity and all forces (gravity, drag, thermophoresis, and electrophoresis) acting on the particles. To avoid gravitational settling of particles onto the mask, its critical surface is facing down. The model shows that at the low pressure level (50 mTorr), drag force is the dominating force to decelerate particles. Thermophoresis can add additional protection. Electrophoresis can be very effective, however, all particles must be unipolarly charged to make use of the Coulomb force.

UR - http://www.scopus.com/inward/record.url?scp=28444477314&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=28444477314&partnerID=8YFLogxK

U2 - 10.1063/1.2140475

DO - 10.1063/1.2140475

M3 - Article

AN - SCOPUS:28444477314

VL - 87

SP - 1

EP - 3

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

IS - 23

M1 - 234111

ER -