Analysis of carbon in SrTiO3 grown by hybrid molecular beam epitaxy

Bharat Jalan, Joël Cagnon, Thomas E. Mates, Susanne Stemmer

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Secondary ion mass spectroscopy (SIMS) was used to investigate carbon impurity concentrations in stoichiometric SrTiO3 films grown by a hybrid molecular beam epitaxy approach that uses an effusion cell to supply strontium, a rf plasma source for oxygen and a metal organic titanium source (titanium tetra isopropoxide). The carbon concentration in the films was measured as a function of growth parameters. At sufficiently high growth temperatures (>800 °C), the films contain a few ppm of carbon. The challenges in accurately quantifying low carbon concentrations are discussed. A carbon-containing contamination layer is detected on the surfaces of SrTiO 3 substrates and air-exposed films by SIMS and in scanning transmission electron microscopy. The contamination layer could be removed by high-temperature predeposition oxygen plasma cleaning.

Original languageEnglish (US)
Pages (from-to)1365-1368
Number of pages4
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Issue number6
StatePublished - 2009

Bibliographical note

Funding Information:
This research was supported by the National Science Foundation through the UCSB MRL (Award No. DMR 05-20415). Acquisition of the oxide MBE system was made possible through a NSF MRI grant (NSF Grant No. DMR-0619698).


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