An on-wafer probe array for measuring two-dimensional ion flux distributions in plasma reactors

Tae Won Kim; Saurabh J. Ullal; Vahid Vahedi; Eray S. Aydil

doi:10.1063/1.1502445

An on-wafer probe array for measuring two-dimensional ion flux distributions in plasma reactors

Tae Won Kim
, Saurabh J. Ullal
, Vahid Vahedi
, Eray S. Aydil

Chemical Engineering and Materials Science

Research output: Contribution to journal › Article › peer-review

15 Scopus citations

Original language	English (US)
Pages (from-to)	3494
Number of pages	1
Journal	Review of Scientific Instruments
Volume	73
Issue number	10
DOIs	https://doi.org/10.1063/1.1502445
State	Published - Oct 2002

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10.1063/1.1502445

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title = "An on-wafer probe array for measuring two-dimensional ion flux distributions in plasma reactors",

author = "Kim, \{Tae Won\} and Ullal, \{Saurabh J.\} and Vahid Vahedi and Aydil, \{Eray S.\}",

year = "2002",

month = oct,

doi = "10.1063/1.1502445",

language = "English (US)",

volume = "73",

pages = "3494",

journal = "Review of Scientific Instruments",

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publisher = "American Institute of Physics",

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AU - Kim, Tae Won

AU - Ullal, Saurabh J.

AU - Vahedi, Vahid

AU - Aydil, Eray S.

PY - 2002/10

Y1 - 2002/10

UR - https://www.scopus.com/pages/publications/18744393710

UR - https://www.scopus.com/pages/publications/18744393710#tab=citedBy

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DO - 10.1063/1.1502445

M3 - Article

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SP - 3494

JO - Review of Scientific Instruments

JF - Review of Scientific Instruments

IS - 10

ER -

An on-wafer probe array for measuring two-dimensional ion flux distributions in plasma reactors

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