Abstract
The de facto modeling method to analyze channel-hot-carrier (CHC) is based on substrate current (Isub), which becomes increasingly problematic with technology scaling as various leakage components dominate Isub. In this work, we present a unified approach that directly predicts the change of key transistor parameters under various process and design conditions, for both negative-bias-temperature-instability (NBTI) and CHC degradation. Using the general reaction-diffusion model and the concept of surface potential, the proposed method continuously captures the performance degradation across subthreshold and strong inversion regions. Models are comprehensively verified with an industrial 65nm technology. We benchmark the prediction of circuit performance degradation with measured ring oscillator data and simulations of an amplifier.
Original language | English (US) |
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Title of host publication | Proceedings of the IEEE 2007 Custom Integrated Circuits Conference, CICC 2007 |
Publisher | Institute of Electrical and Electronics Engineers Inc. |
Pages | 511-514 |
Number of pages | 4 |
ISBN (Electronic) | 1424407869, 9781424407866 |
DOIs | |
State | Published - 2007 |
Externally published | Yes |
Event | 29th Annual IEEE Custom Integrated Circuits Conference, CICC 2007 - San Jose, United States Duration: Sep 16 2007 → Sep 19 2007 |
Publication series
Name | Proceedings of the IEEE 2007 Custom Integrated Circuits Conference, CICC 2007 |
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Conference
Conference | 29th Annual IEEE Custom Integrated Circuits Conference, CICC 2007 |
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Country/Territory | United States |
City | San Jose |
Period | 9/16/07 → 9/19/07 |
Bibliographical note
Publisher Copyright:© 2007 IEEE.