TY - JOUR
T1 - An anomalous diffusion barrier case
T2 - The Hg1- xCdxTe/Yb/Ag junction
AU - Raisanen, A.
AU - Haugstad, G.
AU - Yu, X.
AU - Ceccone, G.
AU - Franciosi, A.
PY - 1990/7
Y1 - 1990/7
N2 - Synchrotron radiation photoemission measurements of Hg1-xCdxTe/Ag junctions both with and without thin Yb interlayers show that the Yb layer acts to reduce Ag indiffusion at all interlayer thicknesses investigated, although three different types of behavior are observed depending on the layer thickness and morphology. We characterized the Yb layer morphology by means of the photoemission of adsorbed xenon technique. Thin (3–6 A) Yb interlayers are only partially effective, with substantial Ag indiffusion still evident. We associate this behavior with a two-dimensional island morphology of the interlayer. Thick (10–15 A) Yb interlayers are highly effective in reducing Ag indiffusion, due to the presence of a continuous reacted Yb layer and of a Yb-rich metallic phase with high alloying enthalpy for Ag. Intermediate thickness (8 A) Yb interlayers, effectively reduce Ag indiffusion at low Ag coverages (<20 A), only to fail catastrophically upon further Ag deposition.
AB - Synchrotron radiation photoemission measurements of Hg1-xCdxTe/Ag junctions both with and without thin Yb interlayers show that the Yb layer acts to reduce Ag indiffusion at all interlayer thicknesses investigated, although three different types of behavior are observed depending on the layer thickness and morphology. We characterized the Yb layer morphology by means of the photoemission of adsorbed xenon technique. Thin (3–6 A) Yb interlayers are only partially effective, with substantial Ag indiffusion still evident. We associate this behavior with a two-dimensional island morphology of the interlayer. Thick (10–15 A) Yb interlayers are highly effective in reducing Ag indiffusion, due to the presence of a continuous reacted Yb layer and of a Yb-rich metallic phase with high alloying enthalpy for Ag. Intermediate thickness (8 A) Yb interlayers, effectively reduce Ag indiffusion at low Ag coverages (<20 A), only to fail catastrophically upon further Ag deposition.
UR - http://www.scopus.com/inward/record.url?scp=84929992286&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84929992286&partnerID=8YFLogxK
U2 - 10.1116/1.576576
DO - 10.1116/1.576576
M3 - Article
AN - SCOPUS:84929992286
SN - 0734-2101
VL - 8
SP - 3265
EP - 3273
JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
IS - 4
ER -