Aluminum particle formation in the gas phase of a low pressure chemical vapor deposition reactor using dimethylethylamine alane (AlH3) as a precursor

Michael G. Simmonds, Wayne L. Gladfelter, Haojiang Li, Peter H. McMurry

Research output: Chapter in Book/Report/Conference proceedingConference contribution

9 Scopus citations

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Chemical Compounds

Engineering & Materials Science

Physics & Astronomy