The adhesion of Pt thin films to NiO substrates has been studied using the continuous microscratch technique. Films of Pt ranging from 65 to 1080 nm in thickness were sputter deposited onto single crystal of NiO. Continuous microscratch experiments were performed by driving a conical diamond indenter, with a nominal radius of 5μm, simultaneously into and across the films until a load drop observed indicating that films had delaminated. The practical work of adhesion increases from 0.03 to 4.7 J/m2 as the film thickness increases from 65 to 1080 nm. Extrapolation of the practical work of adhesion versus film thickness data to zero thickness yields a first order estimate of the true work of adhesion. The true work of adhesion for the as-sputtered Pt/NiO system is determined to be 0. 025 J/m2, a value of the same order as the Van der Waal's energy.
|Original language||English (US)|
|Number of pages||6|
|Journal||Materials Research Society Symposium - Proceedings|
|State||Published - Dec 1 1993|
|Event||Proceedings of the 1993 Spring Meeting of the Materials Research Society - San Francisco, CA, USA|
Duration: Apr 12 1993 → Apr 16 1993