TY - GEN
T1 - Adhesion energy and shape of nanogap InP/InGaAs microcantilevers
AU - Makowski, Jan D.
AU - Gawarikar, Anand S.
AU - Talghader, Joseph J.
PY - 2006
Y1 - 2006
N2 - The adhesion energy is measured between InGaAs quantum wells that have collapsed across a 120 nm airgap in a InP/InGaAs heterostructure. The method relies on measuring the unadhered length and shape of collapsed microcantilevers with optical interferometry. The adhesion energy is found to be 72 ± 16 mJm-2. Since the airgap is much smaller than has been measured previously, the influence of van-der-Waals forces across the gap was included in theoretical modeling. It was found that the forces should not cause significant deviation from the standard adhesion models unless the adhesion energy drops below 25 mJm-2.
AB - The adhesion energy is measured between InGaAs quantum wells that have collapsed across a 120 nm airgap in a InP/InGaAs heterostructure. The method relies on measuring the unadhered length and shape of collapsed microcantilevers with optical interferometry. The adhesion energy is found to be 72 ± 16 mJm-2. Since the airgap is much smaller than has been measured previously, the influence of van-der-Waals forces across the gap was included in theoretical modeling. It was found that the forces should not cause significant deviation from the standard adhesion models unless the adhesion energy drops below 25 mJm-2.
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U2 - 10.1109/COMMAD.2006.4429918
DO - 10.1109/COMMAD.2006.4429918
M3 - Conference contribution
AN - SCOPUS:44849104381
SN - 1424405785
SN - 9781424405787
T3 - Conference on Optoelectronic and Microelectronic Materials and Devices, Proceedings, COMMAD
SP - 212
EP - 215
BT - COMMAD'06 - Proceedings of the 2006 Conference on Optoelectronic and Microelectronic Materials and Devices
T2 - 2006 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2006
Y2 - 6 December 2006 through 8 December 2006
ER -