Adhesion and fracture of tantalum nitride films

Keyphrases

• Adhesion 100%
• Annealing 100%
• Compressive Residual Stress 100%
• Tantalum Nitride 100%
• Nitride Films 100%
• Changes in Structures 50%
• Result Comparison 50%
• Good Measures 50%
• Stress Level 50%
• As-deposited 50%
• Striations 50%
• Residual Stress 50%
• As-deposited Films 50%
• Sputter-deposited 50%
• Indentation Fracture 50%
• Surface Restructuring 50%
• Interfacial Strain 50%
• Nanoscratch Test 50%
• Strain Energy Release Rate 50%
• Residual Stress State 50%
• Mechanics-based Model 50%
• Parallel Array 50%

Engineering

• Compressive Residual Stress 100%
• Nitride 100%
• Deposited Film 50%
• Residual Stress 50%
• Stronger Effect 50%
• Indentation 50%
• Strain-Energy Release Rate 50%
• Stress State 50%
• Stress Level 50%

Material Science

• Film 100%
• Nitride Compound 100%
• Tantalum 100%
• Residual Stress 75%
• Indentation 25%
• Surface (Surface Science) 25%