Acrylic Triblock Copolymers Incorporating Isosorbide for Pressure Sensitive Adhesives

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Abstract

A new monomer acetylated acrylic isosorbide (AAI) was prepared in two steps using common reagents without the need for column chromatography. Free radical polymerization of AAI afforded poly(acetylated acrylic isosorbide) (PAAI), which exhibited a glass transition temperature (Tg) = 95 °C and good thermal stability (Td, 5% weight loss; N2 = 331 °C, air = 291 °C). A series of ABA triblock copolymers with either poly(n-butyl acrylate) (PnBA) or poly(2-ethylhexyl acrylate) (PEHA) as the low Tg midblocks and PAAI as the high Tg end blocks were prepared using Reversible Addition-Fragmentation chain Transfer (RAFT) polymerization. The triblock copolymers ranging from 8-24 wt % PAAI were evaluated as pressure sensitive adhesives by 180° peel, loop tack, and static shear testing. While the PAAI-PEHA-PAAI series exhibited poor adhesive qualities, the PAAI-PnBA-PAAI series of triblock copolymers demonstrated peel forces up to 2.9 N cm-1, tack forces up to 3.2 N cm-1, and no shear failure up to 10 000 min. Dynamic mechanical analysis indicated that PAAI-PEHA-PAAI lacked the dissipative qualities needed to form an adhesive bond with the substrate, while the PAAI-PnBA-PAAI series exhibited a dynamic mechanical response consistent with related high performing PSAs.

Original languageEnglish (US)
Pages (from-to)3379-3387
Number of pages9
JournalACS Sustainable Chemistry and Engineering
Volume4
Issue number6
DOIs
StatePublished - Jun 6 2016

Bibliographical note

Funding Information:
This work was supported by the NSF under the Center for Sustainable Polymers, CHE-1413862. Part of this work was carried out in the College of Science and Engineering Polymer Characterization Facility, University of Minnesota, which has received capital equipment funding from the NSF through the UMN MRSEC program under Award Number DMR-1420013. SAXS was performed at the DuPont?Northwestern?Dow Collaborative Access Team (DND-CAT) located at Sector 5 of the Advanced Photon Source (APS). DND-CAT is supported by E. I. du Pont de Nemours & Co., The Dow Chemical Company, and Northwestern University. Use of the APS, an Office of Science User Facility operated for the U.S. Department of Energy (DOE) Office of Science by Argonne National Laboratory, was supported by the U.S. DOE under Contract DE-AC02-06CH11357.

Publisher Copyright:
© 2016 American Chemical Society.

Keywords

  • 2-Ethylhexyl acrylate
  • Butyl acrylate
  • High T
  • RAFT
  • Renewable
  • Thermoplastic elastomer

How much support was provided by MRSEC?

  • Shared

Reporting period for MRSEC

  • Period 3

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