A wedge-mounting technique for nanoscale electron backscatter diffraction

J. S. Carpenter, R. J. McCabe, I. J. Beyerlein, T. A. Wynn, N. A. Mara

Research output: Contribution to journalArticlepeer-review

35 Scopus citations

Abstract

The practical spatial resolution of electron backscatter diffraction (EBSD) is around 100 nm, which limits the length scales from which phase and orientation relationship characterization can be accomplished. This precludes collection of statistically relevant data on the crystallography of interfaces within nanomaterials where such information is essential for understanding the unique properties of these materials. In this work, we present a wedge-mounting technique that enables EBSD data to be collected for sub-100 nm thick layers of Cu-Nb bimetallic multilayers fabricated via accumulative roll bonding. We present statistics on layer thickness distributions, grain morphology, orientation distributions, twin volume fraction, and interface character for material with an averaged layer thickness of 86 and 56 nm.

Original languageEnglish (US)
Article number094304
JournalJournal of Applied Physics
Volume113
Issue number9
DOIs
StatePublished - Mar 7 2013
Externally publishedYes

Bibliographical note

Funding Information:
This work is supported by the Los Alamos National Laboratory Directed Research and Development (LDRD) project DR20110029. Los Alamos National Laboratory is operated by Los Alamos National Security LLC under DOE Contract DE-AC52-06NA25396. Neutron diffraction results were collected on the high pressure preferred orientation (HIPPO) beam line at the Los Alamos Neutron Science Center with the help of Dr. S. C. Vogel. Electron microscopy was performed at the Los Alamos Electron Microscopy Laboratory.

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