A transmission electron microscopy study of annealed Nb-Ge thin films

Corwin P. Umbach, Louis E. Toth, Allen M. Goldman

Research output: Contribution to journalArticlepeer-review

3 Scopus citations


Microcrystalline sputter-deposited niobium-germanium films were annealed inside a transmission electron microscope and the microcrystalline-to-crystalline phase transformation was studied. From selected area electron diffraction patterns it was found that, in addition to the A15 Nb3Ge and other phases expected, two previously unreported phases were present in the crystalline films. These were identified as being analogous to the tetragonal Ti3P and cubic Cu3Au phases of the niobium-silicon system.

Original languageEnglish (US)
Pages (from-to)319-326
Number of pages8
JournalJournal of The Less-Common Metals
Issue number2
StatePublished - Feb 1980

Bibliographical note

Funding Information:
This work was supported in part by the National Science Foundation under grant DMR 78-08513 and by the Graduate School of the University of Minnesota.


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