A transmission electron microscopy study of annealed Nb-Ge thin films

Corwin P. Umbach, Louis E. Toth, Allen M Goldman

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

Microcrystalline sputter-deposited niobium-germanium films were annealed inside a transmission electron microscope and the microcrystalline-to-crystalline phase transformation was studied. From selected area electron diffraction patterns it was found that, in addition to the A15 Nb3Ge and other phases expected, two previously unreported phases were present in the crystalline films. These were identified as being analogous to the tetragonal Ti3P and cubic Cu3Au phases of the niobium-silicon system.

Original languageEnglish (US)
Pages (from-to)319-326
Number of pages8
JournalJournal of the Less-Common Metals
Volume69
Issue number2
DOIs
StatePublished - Jan 1 1980

Fingerprint

Niobium
Crystalline materials
Germanium
Transmission electron microscopy
Thin films
Silicon
Electron diffraction
Diffraction patterns
Electron microscopes
Phase transitions

Cite this

A transmission electron microscopy study of annealed Nb-Ge thin films. / Umbach, Corwin P.; Toth, Louis E.; Goldman, Allen M.

In: Journal of the Less-Common Metals, Vol. 69, No. 2, 01.01.1980, p. 319-326.

Research output: Contribution to journalArticle

Umbach, Corwin P. ; Toth, Louis E. ; Goldman, Allen M. / A transmission electron microscopy study of annealed Nb-Ge thin films. In: Journal of the Less-Common Metals. 1980 ; Vol. 69, No. 2. pp. 319-326.
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