Microcrystalline sputter-deposited niobium-germanium films were annealed inside a transmission electron microscope and the microcrystalline-to-crystalline phase transformation was studied. From selected area electron diffraction patterns it was found that, in addition to the A15 Nb3Ge and other phases expected, two previously unreported phases were present in the crystalline films. These were identified as being analogous to the tetragonal Ti3P and cubic Cu3Au phases of the niobium-silicon system.
Bibliographical noteFunding Information:
This work was supported in part by the National Science Foundation under grant DMR 78-08513 and by the Graduate School of the University of Minnesota.