A tale of two precursors: uhv-cvd of tio2 from titanium nitrate and titanium isopropoxide

Wavne L. Gladfelter; Charles J. Taylor; David C. Oilmenr; Daniel G. Colombo; G. D. Wilk; Stephen A. Campbell; Jeff Roberts

A tale of two precursors: uhv-cvd of tio₂ from titanium nitrate and titanium isopropoxide

Wavne L. Gladfelter, Charles J. Taylor, David C. Oilmenr, Daniel G. Colombo, G. D. Wilk, Stephen A. Campbell, Jeff Roberts

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5 Scopus citations

Abstract

A side-by-side comparison of the TiO₂ deposition kinetics and the corresponding film microstructures using titanium(IV) isopropoxide and anhydrous titanium(IV) nitrate was conducted at low pressures (< ICH Torr) in an ultrahigh vacuum chemical vapor deposition reactor. Titanium(IV) nitrate exhibited a lower activation energy of reaction (E_r = 98 kJ/mol) which allowed deposition at lower temperatures compared to titanium(IV) isopropoxide (E_r = 135 kJ/mol). Comparison of the microstructures of films deposited at similar temperatures revealed significant differences in the reaction rate limited kinetic regime. As the growth rates of the two precursors converged in the flux-limited regime, the respective microstructures became indistinguishable.

Original language	English (US)
Title of host publication	Materials Research Society Symposium - Proceedings
Pages	349-354
Number of pages	6
Volume	567
State	Published - 1999

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title = "A tale of two precursors: uhv-cvd of tio2 from titanium nitrate and titanium isopropoxide",

abstract = "A side-by-side comparison of the TiO2 deposition kinetics and the corresponding film microstructures using titanium(IV) isopropoxide and anhydrous titanium(IV) nitrate was conducted at low pressures (< ICH Torr) in an ultrahigh vacuum chemical vapor deposition reactor. Titanium(IV) nitrate exhibited a lower activation energy of reaction (Er = 98 kJ/mol) which allowed deposition at lower temperatures compared to titanium(IV) isopropoxide (Er = 135 kJ/mol). Comparison of the microstructures of films deposited at similar temperatures revealed significant differences in the reaction rate limited kinetic regime. As the growth rates of the two precursors converged in the flux-limited regime, the respective microstructures became indistinguishable.",

author = "Gladfelter, {Wavne L.} and Taylor, {Charles J.} and Oilmenr, {David C.} and Colombo, {Daniel G.} and Wilk, {G. D.} and Campbell, {Stephen A.} and Jeff Roberts",

year = "1999",

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T1 - A tale of two precursors

T2 - uhv-cvd of tio2 from titanium nitrate and titanium isopropoxide

AU - Gladfelter, Wavne L.

AU - Taylor, Charles J.

AU - Oilmenr, David C.

AU - Colombo, Daniel G.

AU - Wilk, G. D.

AU - Campbell, Stephen A.

AU - Roberts, Jeff

PY - 1999

Y1 - 1999

N2 - A side-by-side comparison of the TiO2 deposition kinetics and the corresponding film microstructures using titanium(IV) isopropoxide and anhydrous titanium(IV) nitrate was conducted at low pressures (< ICH Torr) in an ultrahigh vacuum chemical vapor deposition reactor. Titanium(IV) nitrate exhibited a lower activation energy of reaction (Er = 98 kJ/mol) which allowed deposition at lower temperatures compared to titanium(IV) isopropoxide (Er = 135 kJ/mol). Comparison of the microstructures of films deposited at similar temperatures revealed significant differences in the reaction rate limited kinetic regime. As the growth rates of the two precursors converged in the flux-limited regime, the respective microstructures became indistinguishable.

AB - A side-by-side comparison of the TiO2 deposition kinetics and the corresponding film microstructures using titanium(IV) isopropoxide and anhydrous titanium(IV) nitrate was conducted at low pressures (< ICH Torr) in an ultrahigh vacuum chemical vapor deposition reactor. Titanium(IV) nitrate exhibited a lower activation energy of reaction (Er = 98 kJ/mol) which allowed deposition at lower temperatures compared to titanium(IV) isopropoxide (Er = 135 kJ/mol). Comparison of the microstructures of films deposited at similar temperatures revealed significant differences in the reaction rate limited kinetic regime. As the growth rates of the two precursors converged in the flux-limited regime, the respective microstructures became indistinguishable.

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M3 - Chapter

AN - SCOPUS:0033355958

VL - 567

SP - 349

EP - 354

BT - Materials Research Society Symposium - Proceedings

ER -

A tale of two precursors: uhv-cvd of tio₂ from titanium nitrate and titanium isopropoxide

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