Keyphrases
Adsorption
20%
Auger Electron Spectroscopy
20%
Chemical Vapor Deposition
20%
Chemical Vapor Deposition Growth
100%
Deposition Temperature
40%
Ellipsometry
20%
Film Density
20%
Film Microstructure
100%
Growth Kinetics
100%
Induction Period
20%
Low Temperature
20%
Polycrystalline Zirconia
20%
Rutherford Backscattering Spectrometry
20%
Scanning Electron Microscopy
20%
Si(111)
20%
Single Precursor
20%
Steady State
20%
Tert-butoxide
100%
TETRA
100%
Two-step Kinetic Model
20%
X Ray Diffraction
20%
Zirconia
100%
Zirconium Dioxide
100%
ZrO2 Films
20%
Engineering
Adsorption
50%
Chemical Vapor Deposition
100%
Deposition Temperature
100%
Film Density
50%
Growth Kinetics
100%
Induction Period
50%
Kinetic Model
50%
Low-Temperature
50%
Microstructure
100%
Polycrystalline
50%
Ray Diffraction
50%
Torr
100%
Vapor Deposition
100%
Material Science
Auger Electron Spectroscopy
16%
Chemical Vapor Deposition
100%
Density
16%
Film
100%
Rutherford Backscattering Spectrometry
16%
Scanning Electron Microscopy
16%
X-Ray Diffraction
16%
Zirconia
100%
Zirconium
100%
Chemical Engineering
Adsorption
50%
Chemical Vapor Deposition
100%
Ellipsometry
50%
Spectrometry
50%
Vapor Deposition
100%