A precise and scalable post-modification of mesoporous metal-organic framework NU-1000 via atomic layer deposition

I. S. Kim, O. K. Farha, J. T. Hupp, L. Gagliardi, K. W. Chapman, C. J. Cramer, A. B F Martinson

Research output: Chapter in Book/Report/Conference proceedingConference contribution

4 Scopus citations

Abstract

The connectivity of NU-1000, a metal-organic framework, gives rise to Zr6 nodes with hydroxyl-containing functional groups pointing into the large 1D mesoporous hexagonal channels of the framework. These free and exposed-OH groups are ideal grafting sites, and they can be easily tailored to serve a specific function. Through atomic layer deposition in MOFs (AIM), we demonstrate the ability to form several oxides with atomic precision at the exposed-OH sites of NU-1000. Importantly, this process occurs without changing the overall structure of the framework. Recent progress in scaling AIM process of the ultrahigh surface area (2300 m2/g) framework as well as progress in pinpointing the location and mechanism of surface chemical reactions of catalytically relevant metals is discussed. Computational, synchrotron, and in-situ analytical methods including DFT, differential electron diffraction, and in situ FTIR are brought to bear on several new metal systems, many of which show remarkably self-limiting behavior.

Original languageEnglish (US)
Title of host publicationAtomic Layer Deposition Applications 12
EditorsF. Roozeboom, J. W. Elam, J. Dendooven, O. van der Straten, S. De Gendt, C. Liu, C. Huffman
PublisherElectrochemical Society Inc.
Pages93-99
Number of pages7
Edition6
ISBN (Electronic)9781607685395
DOIs
StatePublished - Jan 1 2016
EventSymposium on Atomic Layer Deposition Applications 12 - PRiME 2016/230th ECS Meeting - Honolulu, United States
Duration: Oct 2 2016Oct 7 2016

Publication series

NameECS Transactions
Number6
Volume75
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

Other

OtherSymposium on Atomic Layer Deposition Applications 12 - PRiME 2016/230th ECS Meeting
CountryUnited States
CityHonolulu
Period10/2/1610/7/16

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    Kim, I. S., Farha, O. K., Hupp, J. T., Gagliardi, L., Chapman, K. W., Cramer, C. J., & Martinson, A. B. F. (2016). A precise and scalable post-modification of mesoporous metal-organic framework NU-1000 via atomic layer deposition. In F. Roozeboom, J. W. Elam, J. Dendooven, O. van der Straten, S. De Gendt, C. Liu, & C. Huffman (Eds.), Atomic Layer Deposition Applications 12 (6 ed., pp. 93-99). (ECS Transactions; Vol. 75, No. 6). Electrochemical Society Inc.. https://doi.org/10.1149/07506.0093ecst