A precise and scalable post-modification of mesoporous metal-organic framework NU-1000 via atomic layer deposition

I. S. Kim, O. K. Farha, J. T. Hupp, L. Gagliardi, K. W. Chapman, C. J. Cramer, A. B F Martinson

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Citations (Scopus)

Abstract

The connectivity of NU-1000, a metal-organic framework, gives rise to Zr6 nodes with hydroxyl-containing functional groups pointing into the large 1D mesoporous hexagonal channels of the framework. These free and exposed-OH groups are ideal grafting sites, and they can be easily tailored to serve a specific function. Through atomic layer deposition in MOFs (AIM), we demonstrate the ability to form several oxides with atomic precision at the exposed-OH sites of NU-1000. Importantly, this process occurs without changing the overall structure of the framework. Recent progress in scaling AIM process of the ultrahigh surface area (2300 m2/g) framework as well as progress in pinpointing the location and mechanism of surface chemical reactions of catalytically relevant metals is discussed. Computational, synchrotron, and in-situ analytical methods including DFT, differential electron diffraction, and in situ FTIR are brought to bear on several new metal systems, many of which show remarkably self-limiting behavior.

Original languageEnglish (US)
Title of host publicationAtomic Layer Deposition Applications 12
PublisherElectrochemical Society Inc.
Pages93-99
Number of pages7
Volume75
Edition6
ISBN (Electronic)9781607685395
DOIs
StatePublished - Jan 1 2016
EventSymposium on Atomic Layer Deposition Applications 12 - PRiME 2016/230th ECS Meeting - Honolulu, United States
Duration: Oct 2 2016Oct 7 2016

Other

OtherSymposium on Atomic Layer Deposition Applications 12 - PRiME 2016/230th ECS Meeting
CountryUnited States
CityHonolulu
Period10/2/1610/7/16

Fingerprint

Atomic layer deposition
Metals
Synchrotrons
Discrete Fourier transforms
Electron diffraction
Functional groups
Chemical reactions
Oxides

Cite this

Kim, I. S., Farha, O. K., Hupp, J. T., Gagliardi, L., Chapman, K. W., Cramer, C. J., & Martinson, A. B. F. (2016). A precise and scalable post-modification of mesoporous metal-organic framework NU-1000 via atomic layer deposition. In Atomic Layer Deposition Applications 12 (6 ed., Vol. 75, pp. 93-99). Electrochemical Society Inc.. https://doi.org/10.1149/07506.0093ecst

A precise and scalable post-modification of mesoporous metal-organic framework NU-1000 via atomic layer deposition. / Kim, I. S.; Farha, O. K.; Hupp, J. T.; Gagliardi, L.; Chapman, K. W.; Cramer, C. J.; Martinson, A. B F.

Atomic Layer Deposition Applications 12. Vol. 75 6. ed. Electrochemical Society Inc., 2016. p. 93-99.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Kim, IS, Farha, OK, Hupp, JT, Gagliardi, L, Chapman, KW, Cramer, CJ & Martinson, ABF 2016, A precise and scalable post-modification of mesoporous metal-organic framework NU-1000 via atomic layer deposition. in Atomic Layer Deposition Applications 12. 6 edn, vol. 75, Electrochemical Society Inc., pp. 93-99, Symposium on Atomic Layer Deposition Applications 12 - PRiME 2016/230th ECS Meeting, Honolulu, United States, 10/2/16. https://doi.org/10.1149/07506.0093ecst
Kim IS, Farha OK, Hupp JT, Gagliardi L, Chapman KW, Cramer CJ et al. A precise and scalable post-modification of mesoporous metal-organic framework NU-1000 via atomic layer deposition. In Atomic Layer Deposition Applications 12. 6 ed. Vol. 75. Electrochemical Society Inc. 2016. p. 93-99 https://doi.org/10.1149/07506.0093ecst
Kim, I. S. ; Farha, O. K. ; Hupp, J. T. ; Gagliardi, L. ; Chapman, K. W. ; Cramer, C. J. ; Martinson, A. B F. / A precise and scalable post-modification of mesoporous metal-organic framework NU-1000 via atomic layer deposition. Atomic Layer Deposition Applications 12. Vol. 75 6. ed. Electrochemical Society Inc., 2016. pp. 93-99
@inproceedings{26c79b461b564a07a71d3ca9b7d99fcc,
title = "A precise and scalable post-modification of mesoporous metal-organic framework NU-1000 via atomic layer deposition",
abstract = "The connectivity of NU-1000, a metal-organic framework, gives rise to Zr6 nodes with hydroxyl-containing functional groups pointing into the large 1D mesoporous hexagonal channels of the framework. These free and exposed-OH groups are ideal grafting sites, and they can be easily tailored to serve a specific function. Through atomic layer deposition in MOFs (AIM), we demonstrate the ability to form several oxides with atomic precision at the exposed-OH sites of NU-1000. Importantly, this process occurs without changing the overall structure of the framework. Recent progress in scaling AIM process of the ultrahigh surface area (2300 m2/g) framework as well as progress in pinpointing the location and mechanism of surface chemical reactions of catalytically relevant metals is discussed. Computational, synchrotron, and in-situ analytical methods including DFT, differential electron diffraction, and in situ FTIR are brought to bear on several new metal systems, many of which show remarkably self-limiting behavior.",
author = "Kim, {I. S.} and Farha, {O. K.} and Hupp, {J. T.} and L. Gagliardi and Chapman, {K. W.} and Cramer, {C. J.} and Martinson, {A. B F}",
year = "2016",
month = "1",
day = "1",
doi = "10.1149/07506.0093ecst",
language = "English (US)",
volume = "75",
pages = "93--99",
booktitle = "Atomic Layer Deposition Applications 12",
publisher = "Electrochemical Society Inc.",
edition = "6",

}

TY - GEN

T1 - A precise and scalable post-modification of mesoporous metal-organic framework NU-1000 via atomic layer deposition

AU - Kim, I. S.

AU - Farha, O. K.

AU - Hupp, J. T.

AU - Gagliardi, L.

AU - Chapman, K. W.

AU - Cramer, C. J.

AU - Martinson, A. B F

PY - 2016/1/1

Y1 - 2016/1/1

N2 - The connectivity of NU-1000, a metal-organic framework, gives rise to Zr6 nodes with hydroxyl-containing functional groups pointing into the large 1D mesoporous hexagonal channels of the framework. These free and exposed-OH groups are ideal grafting sites, and they can be easily tailored to serve a specific function. Through atomic layer deposition in MOFs (AIM), we demonstrate the ability to form several oxides with atomic precision at the exposed-OH sites of NU-1000. Importantly, this process occurs without changing the overall structure of the framework. Recent progress in scaling AIM process of the ultrahigh surface area (2300 m2/g) framework as well as progress in pinpointing the location and mechanism of surface chemical reactions of catalytically relevant metals is discussed. Computational, synchrotron, and in-situ analytical methods including DFT, differential electron diffraction, and in situ FTIR are brought to bear on several new metal systems, many of which show remarkably self-limiting behavior.

AB - The connectivity of NU-1000, a metal-organic framework, gives rise to Zr6 nodes with hydroxyl-containing functional groups pointing into the large 1D mesoporous hexagonal channels of the framework. These free and exposed-OH groups are ideal grafting sites, and they can be easily tailored to serve a specific function. Through atomic layer deposition in MOFs (AIM), we demonstrate the ability to form several oxides with atomic precision at the exposed-OH sites of NU-1000. Importantly, this process occurs without changing the overall structure of the framework. Recent progress in scaling AIM process of the ultrahigh surface area (2300 m2/g) framework as well as progress in pinpointing the location and mechanism of surface chemical reactions of catalytically relevant metals is discussed. Computational, synchrotron, and in-situ analytical methods including DFT, differential electron diffraction, and in situ FTIR are brought to bear on several new metal systems, many of which show remarkably self-limiting behavior.

UR - http://www.scopus.com/inward/record.url?scp=84991728488&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84991728488&partnerID=8YFLogxK

U2 - 10.1149/07506.0093ecst

DO - 10.1149/07506.0093ecst

M3 - Conference contribution

VL - 75

SP - 93

EP - 99

BT - Atomic Layer Deposition Applications 12

PB - Electrochemical Society Inc.

ER -