A photochemical approach to directing flow and stabilizing topography in polymer films

Joshua M. Katzenstein, Chae Bin Kim, Nathan A. Prisco, Reika Katsumata, Zhenpeng Li, Dustin W. Janes, Gregory Blachut, Christopher J. Ellison

Research output: Contribution to journalArticlepeer-review

10 Scopus citations

Abstract

Coatings and substrates with topographically patterned features will play an important role in efficient technologies for harvesting and transmitting light energy. In order to address these applications, a methodology for prescribing height profiles in polymer films is presented here. This is accomplished by photochemcially patterning a solid-state, sensitized polymer film. After heating the film above its glass transition temperature, melt-state flow is triggered and directed by the chemical pattern. A second light exposure was applied to fully activate a heat-stable photo-crosslinking additive. The features formed here are thermochemically stable and can act as an underlayer in a multilayered film. To exemplify this capability, these films were also used to direct the macroscopic film morphology of a block copolymer overlayer.

Original languageEnglish (US)
Pages (from-to)6804-6812
Number of pages9
JournalMacromolecules
Volume47
Issue number19
DOIs
StatePublished - Oct 14 2014

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