Abstract
Coatings and substrates with topographically patterned features will play an important role in efficient technologies for harvesting and transmitting light energy. In order to address these applications, a methodology for prescribing height profiles in polymer films is presented here. This is accomplished by photochemcially patterning a solid-state, sensitized polymer film. After heating the film above its glass transition temperature, melt-state flow is triggered and directed by the chemical pattern. A second light exposure was applied to fully activate a heat-stable photo-crosslinking additive. The features formed here are thermochemically stable and can act as an underlayer in a multilayered film. To exemplify this capability, these films were also used to direct the macroscopic film morphology of a block copolymer overlayer.
Original language | English (US) |
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Pages (from-to) | 6804-6812 |
Number of pages | 9 |
Journal | Macromolecules |
Volume | 47 |
Issue number | 19 |
DOIs | |
State | Published - Oct 14 2014 |
Externally published | Yes |
Bibliographical note
Publisher Copyright:© 2014 American Chemical Society.