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A Novel Scalable Energy-Efficient Synaptic Device: Crossbar Ferroelectric Semiconductor Junction

  • M. Si
  • , P. D. Ye
  • , Y. Luo
  • , W. Chung
  • , H. Bae
  • , D. Zheng
  • , J. Li
  • , J. Qin
  • , G. Qiu
  • , S. Yu

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

A novel ferroelectric semiconductor junction (FSJ) based two-terminal memristor is demonstrated as a synaptic device for the first time. In this novel FSJ device, a metal-ferroelectric semiconductor (FS)-metal crossbar structure is used, instead of a metal-ferroelectric insulator-metal structure for a conventional ferroelectric tunnel junction (FTJ), so that an ultra-thin ferroelectric insulator is not required. Meanwhile, the FSJ also offers energy efficiency advantage over the conventional filament-based resistive random access memory (RRAM) device because the conductance of the FSJ scales with the junction area. Experimentally, a ferroelectric semiconductor α-In2Se3 based crossbar FSJ (c-FSJ) as a synaptic device is demonstrated. Ferroelectric resistive switching is clearly observed in both planar FSJ (p-FSJ) by in-plane polarization switching and c-FSJ by out-of-plane polarization switching. Conductance potentiation and depression in the c-FSJ are measured and benchmarked at both original size and projected to 32 nm node with different synaptic devices. α-In2Se3 c-FSJ shows good on-line learning accuracy (~92 %), low latency and energy consumption due to the short write pulse width and large RON.

Original languageEnglish (US)
Title of host publication2019 IEEE International Electron Devices Meeting, IEDM 2019
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781728140315
DOIs
StatePublished - Dec 2019
Externally publishedYes
Event65th Annual IEEE International Electron Devices Meeting, IEDM 2019 - San Francisco, United States
Duration: Dec 7 2019Dec 11 2019

Publication series

NameTechnical Digest - International Electron Devices Meeting, IEDM
Volume2019-December
ISSN (Print)0163-1918

Conference

Conference65th Annual IEEE International Electron Devices Meeting, IEDM 2019
Country/TerritoryUnited States
CitySan Francisco
Period12/7/1912/11/19

Bibliographical note

Publisher Copyright:
© 2019 IEEE.

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