A lithography lab course has been developed that is applicable to students from the middle-school level up to college students. It can also be inserted into electronics technology or similar courses in two- and four-year colleges, or used to demonstrate applications of polymers in chemistry classes. Some of these techniques would enable research projects that involve photolithography for those who lack access to a research lab. The major contribution of this course is the innovative methodology, which allows students to have a hands-on experience of lithographywithout using expensive equipment typically found only in a clean room. Optical lithography, microcontact printing, and embossing can be performed using basic equipment. The appendix of this paper provides a comprehensive list of this equipment. The photolithography results are comparable to those obtained with standard research tools.
Bibliographical noteFunding Information:
Manuscript received February 20, 2012; accepted March 08, 2012. Date of publication April 16, 2012; date of current version October 26, 2012. This work was supported by the Nano-Link Advanced Technical Education Center, funded by the National Science Foundation under Award #0802323. M. Jalali and S. A. Campbell are with the Department of Electrical and Computer Engineering, University of Minnesota, Minneapolis, MN 55455 USA (e-mail: email@example.com). J. J. Marti is with the Nanofabrication Center, University of Minnesota, Minneapolis, MN 55455 USA. A. L. Kirchhoff and F. Lawrenz are with Department of Educational Psychology, University of Minnesota, Minneapolis, MN 55455 USA. Color versions of one or more of the figures in this paper are available online at http://ieeexplore.ieee.org. Digital Object Identifier 10.1109/TE.2012.2192442
- Hot embossing
- Microelectromechanical systems (MEMS)