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A finite-oxide thickness-based analytical model for negative bias temperature instability
Sanjay V. Kumar
,
Chris H. Kim
,
Sachin S. Sapatnekar
Electrical and Computer Engineering
Research output
:
Contribution to journal
›
Article
›
peer-review
27
Scopus citations
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Dive into the research topics of 'A finite-oxide thickness-based analytical model for negative bias temperature instability'. Together they form a unique fingerprint.
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Keyphrases
Oxide Thickness
100%
Analytical Model
100%
Negative Bias Temperature Instability
100%
Digital Circuits
16%
Annealing
16%
Reaction-diffusion
16%
Physical Effects
16%
Polysilicon
16%
Reliable Operation
16%
Generalized Framework
16%
Temporal Degradation
16%
Circuit Degradation
16%
PMOS Transistor
16%
Trap Generation
16%
Digital Circuit Design
16%
Finite Duration
16%
Interface Traps
16%
Technology Scaling
16%
Engineering
Oxide Thickness
100%
Analytical Model
100%
Negative bias temperature instability
100%
Digital Circuits
16%
Function of Time
16%
Reliable Operation
16%
Periodic Time
16%
Interface Trap
16%
Digital Electronics
16%
Polysilicon
16%