1/f noise and thermal equilibration effects in hot wire deposited amorphous silicon

Keyphrases

• Amorphous Silicon 100%
• Conductance Fluctuations 100%
• A-Si 100%
• Plasma-enhanced Chemical Vapor Deposition (PECVD) 100%
• Thermal Equilibration 100%
• Hot Wire 100%
• Hot Filament Chemical Vapor Deposition (HFCVD) 100%
• Electronic Transport 50%
• Spectral Density 50%
• Undoped 50%
• Non-Gaussian 50%
• Noise Statistics 50%
• Hydrogenated Amorphous Silicon Thin Film 50%
• Hydrogen Content 50%
• Hydrogen Concentration 50%
• Dark Conductivity 50%
• Transport Dynamics 50%
• Defect Dynamics 50%
• Electronic Defects 50%

Engineering

• Chemical Vapor Deposition 100%
• Vapor Deposition 100%
• Equilibration 100%
• Defects 50%
• Hydrogenated Amorphous Silicon 50%
• Gaussians 50%
• Thin Films 50%

Material Science

• Amorphous Silicon 100%
• Chemical Vapor Deposition 100%
• Film 100%
• Density 50%
• Thin Films 50%