Abstract
Results on MSM photodiodes fabricated on relaxed absorbing layers of single-crystal Si0.75Ge0.25 grown epitaxially on Si substrates are presented. These photodiodes have bandwidths in excess of 1 GHz and have the distinct advantage of being fully compatible with Si/SiGe which electron mobility transistors. The operation of the device is discussed.
Original language | English (US) |
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Title of host publication | Annual Device Research Conference Digest |
Publisher | IEEE |
Pages | 60-61 |
Number of pages | 2 |
State | Published - Dec 1 1998 |
Event | Proceedings of the 1998 56th Annual Device Research Conference - Charlottesville, VA, USA Duration: Jun 22 1998 → Jun 24 1998 |
Other
Other | Proceedings of the 1998 56th Annual Device Research Conference |
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City | Charlottesville, VA, USA |
Period | 6/22/98 → 6/24/98 |