Keyphrases
Electron Beam Lithography
93%
Sub-10 Nm
54%
Black Arsenic
54%
Hydrogen Silsesquioxane
54%
Poly(methyl methacrylate)
54%
Metrology
45%
Absorber
45%
Lithography
45%
Integrated Circuits
36%
High-resolution
34%
Field-effect Transistors
34%
Sub-5 Nm
32%
Development Rate
32%
Fabrication Methods
30%
Scanning Electron Microscopy
28%
Terahertz Absorber
27%
Negative Resist
27%
High Fill Factor
27%
Superconducting Nanowire Single-photon Detector (SNSPD)
27%
Circuit Application
27%
Anisotropic Structure
27%
Interband
27%
Raindrop
27%
Metal Contact
27%
Disk Array
27%
Metal Interfaces
27%
Electron Beam Resist
27%
Device Fabrication
27%
Layered Polymers
27%
Fill Factor
27%
Polymer-clay Nanocomposites
27%
Infrared Metamaterial Absorber
27%
Miniaturization
27%
Reaction Conditions
27%
Ion Transport
27%
Metal Deposition
27%
Grayscale Image
27%
Electrochemical Impedance Spectroscopy
27%
Polarization-insensitive
27%
Absorption Bands
27%
Submicron Scale
27%
Metamaterials
27%
Resist Contrast
27%
Five-band
27%
Shadow Mask
27%
Anisotropic Transport
27%
Tunnel Diode
27%
Pitch Structure
24%
Atomic Force Microscopy
19%
Negative Tone
18%
Raindrop Shape
18%
Scanning Electron Microscope
18%
Submicron
18%
Reflection Symmetry
18%
Metal-insulator-metal
18%
Submicron Particles
18%
Grayscale
18%
Absorption Peak
18%
Nanophotonics
18%
Resolution Limit
16%
Developer Performance
13%
Thick Resist
13%
Red Phosphorus
13%
Thin Film Growth Process
13%
Arsenic Phosphorus
13%
Reaction Duration
13%
Si-based
13%
Intermetallic Layer
13%
Clay Structure
13%
Cross-plane
13%
Laponite Clay
13%
Process Rate
13%
Threshold Voltage
13%
Diffraction
13%
X-ray Photoelectron Spectroscopy
13%
Silica
13%
Ampule
13%
Structural Anisotropy
13%
High-resolution Structures
13%
Maximum Temperature
13%
Layered Structure
13%
Mass Ratio
13%
Surface Charge
13%
Thin Film Growth
13%
Electron Backscatter Diffraction
13%
Raman Spectroscopy
13%
Tin(IV)
13%
Nanowires
13%
Iodide
13%
Polyethyleneimine
13%
Detection Efficiency
13%
Field-effect Hole Mobility
13%
Trilayer
13%
Layer-by-layer Assembly
13%
Ellipsometry
13%
Accurate Assessment
13%
Wide-angle X-ray Diffraction
13%
Photolithography
13%
Growth Techniques
13%
First Application
13%
Material Science
Lithography
100%
Silsesquioxane
54%
Arsenic
54%
Metamaterial
54%
Electronic Circuit
45%
Scanning Electron Microscopy
36%
Field Effect Transistors
34%
Density
29%
Nanocomposites
27%
Nanowires
27%
Metal Deposition
27%
Metal Interface
27%
Device Fabrication
27%
Poly Methyl Methacrylate
27%
Josephson Junction
27%
Thin Films
27%
Dielectric Spectroscopy
27%
Film
20%
Linewidth
18%
Tin
18%
Thin Film Growth
18%
Surface Charge
13%
Dielectric Material
13%
Intermetallics
13%
Polyethylene
13%
Anisotropy
13%
Polyethylene Glycol
13%
Hydrogen Bonding
13%
Electrostatic Interaction
13%
Wide Angle X-Ray Diffraction
13%
Absorption Spectrum
13%
Transistor
13%
Atomic Spectroscopy
13%
Solution
9%
Nanocrystalline Material
9%
Electron Backscatter Diffraction
9%
Transmission Electron Microscopy
9%
Film Growth
9%
Photoemission Spectroscopy
9%
Single Crystal
9%
Crystal Structure
9%
Oxidation Reaction
9%
Organic Solvents
9%
Mechanical Stability
9%
Superconducting Material
9%
Copolymer
9%
Hole Mobility
9%
Oxide Compound
9%
Raman Spectroscopy
9%
Mechanical Strength
6%
Two-Dimensional Material
6%
Electronic Property
6%
Titanium
6%
Chromium
6%
Engineering
Electron Optical Lithography
68%
Arsenic
54%
Lithography
47%
High Resolution
34%
Field-Effect Transistor
34%
Integrated Circuit
27%
Terahertz
27%
Structural Parameter
27%
Shadow Mask
27%
Support Layer
27%
Tunnel Diode
27%
Metal Contact
27%
Metal-Insulator-Metal
27%
Thin Films
27%
Grayscale
27%
Grayscale Image
27%
Josephson Junction
20%
Thin Film Growth
18%
Resolution Limit
16%
Transmissions
14%
Simulation Result
13%
Electrical Field
13%
Dielectric Layer
13%
Structural Configuration
13%
Metal Layer
13%
Experimental Exploration
13%
Interfacial Layer
13%
Intermetallics
13%
Rotational Symmetry
13%
Scanning Electron Microscope
13%
Development Process
12%
Red Phosphor
9%
Maximum Temperature
9%
Reactant
9%
Film Growth Process
9%
Growth Mechanism
9%
Ray Photoelectron Spectroscopy
9%
Elemental Composition
9%
Ray Diffraction
9%
Mass Ratio
9%
Current Ratio
9%
Crystal Structure
9%
Nanoscale
6%
Fabrication Technique
6%
Engineering
6%
Thin Layer
6%
Mechanical Stability
6%
Base Solution
6%
Crystallinity
6%
2D Material
6%
Step Oxidation
6%
Methacrylic
6%
Molecular Weight
6%
Experimental Result
6%
Lena Image
6%
Photoresist
6%
Aqueous Solution
6%
Nanometre
6%
Spread Function
5%
Length Scale
5%
Atomic Force Microscopy
5%